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This module was developed as part of the Rice University course CHEM-496: Chemistry of Electronic Materials . This module was prepared with the assistance of Angela Cindy Wei.

Photolithography

In photolithography, a pattern may be transferred onto a photoresist film by exposing the photoresist to light through a mask of the pattern. In the semiconductor industry, the photolithographic procedure includes the following steps as illustrated in [link] : coating a base material with photoresist, exposing the resist through a mask to light, developing the resist, etching the exposed areas of the base, and stripping the remaining resist off.

Steps in optical printing using photolithography.

Upon exposure to light, the photoresist may become more or less soluble depending on the chemical properties of the particular resist material. The photochemical reactions include chain scission, cross-linking, and the rearrangement of molecules. If the exposed areas of the photoresist become more soluble, then it is a positive resist; conversely, if the exposed resist becomes less soluble, then it is a negative resist. In developing the photoresist, the more soluble material is removed leaving a positive or a negative image of the mask pattern.

Photoresist

Photoresists were initially developed for the printing industry. In the 1920s, the application of photoresists spread to the printed circuit board industry. Photoresists for semiconductor use were first developed in the 1950s; Kodak developed commercial negative photoresists and shortly after, Shipley developed a line of positive resists. Several other companies have entered the market since that time in hopes of manufacturing resist products which meet the increasing demands of the semiconductor industry: narrower line widths, fewer defects, and higher production rates.

Photoresist composition

Several functional requirements must be met for a photoresist to be used in the semiconductor industry. Photoresist polymers must be soluble for easy deposition onto a substrate by spin-coating. Good photoresist-substrate adhesion properties are required to minimize undercutting, to maintain edge acuity, and to control the feature sizes. The photoresist must be chemically resistant to whichever etchants are to be used. Sensitivity of the photoresist to a particular light source is essential to the functionality of a photoresist. The speed at which chemical changes occur in a photoresist is its contrast. The contrast of a resist is dependent on the molecular weight distribution of the polymers: a broad molecular weight distribution results in a low contrast resist. High contrast resists produce higher resolution images.

The four basic components of a photoresist are the polymer, the solvent, sensitizers, and other additives. The role of the polymer is to either polymerize or photosolubilize when exposed to light. Solvents allow the photoresist to be applied by spin-coating. The sensitizers control the photochemical reactions and additives may be used to facilitate processing or to enhance material properties. Photochemical changes to polymers are essential to the functionality of a photoresist. Polymers are composed primarily of carbon, hydrogen, and oxygen-based molecules arranged in a repeated pattern. Negative photoresists are based on polyisopreme polymers; negative resist polymers are not chemically bonded to each other, but upon exposure to light, the polymers crosslink, or polymerize. Positive photoresists are formulated from phenol-formaldehyde novolak resins; the positive resist polymers are relatively insoluble, but upon exposure to light, the polymers undergo photosolubilization.

Questions & Answers

A golfer on a fairway is 70 m away from the green, which sits below the level of the fairway by 20 m. If the golfer hits the ball at an angle of 40° with an initial speed of 20 m/s, how close to the green does she come?
Aislinn Reply
cm
tijani
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John Reply
what is physics
Siyaka Reply
A mouse of mass 200 g falls 100 m down a vertical mine shaft and lands at the bottom with a speed of 8.0 m/s. During its fall, how much work is done on the mouse by air resistance
Jude Reply
Can you compute that for me. Ty
Jude
what is the dimension formula of energy?
David Reply
what is viscosity?
David
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emma Reply
what is chemistry
Youesf Reply
what is inorganic
emma
Chemistry is a branch of science that deals with the study of matter,it composition,it structure and the changes it undergoes
Adjei
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Adjanou
chemistry could also be understood like the sexual attraction/repulsion of the male and female elements. the reaction varies depending on the energy differences of each given gender. + masculine -female.
Pedro
A ball is thrown straight up.it passes a 2.0m high window 7.50 m off the ground on it path up and takes 1.30 s to go past the window.what was the ball initial velocity
Krampah Reply
2. A sled plus passenger with total mass 50 kg is pulled 20 m across the snow (0.20) at constant velocity by a force directed 25° above the horizontal. Calculate (a) the work of the applied force, (b) the work of friction, and (c) the total work.
Sahid Reply
you have been hired as an espert witness in a court case involving an automobile accident. the accident involved car A of mass 1500kg which crashed into stationary car B of mass 1100kg. the driver of car A applied his brakes 15 m before he skidded and crashed into car B. after the collision, car A s
Samuel Reply
can someone explain to me, an ignorant high school student, why the trend of the graph doesn't follow the fact that the higher frequency a sound wave is, the more power it is, hence, making me think the phons output would follow this general trend?
Joseph Reply
Nevermind i just realied that the graph is the phons output for a person with normal hearing and not just the phons output of the sound waves power, I should read the entire thing next time
Joseph
Follow up question, does anyone know where I can find a graph that accuretly depicts the actual relative "power" output of sound over its frequency instead of just humans hearing
Joseph
"Generation of electrical energy from sound energy | IEEE Conference Publication | IEEE Xplore" ***ieeexplore.ieee.org/document/7150687?reload=true
Ryan
what's motion
Maurice Reply
what are the types of wave
Maurice
answer
Magreth
progressive wave
Magreth
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Muhammad Reply
fine, how about you?
Mohammed
hi
Mujahid
A string is 3.00 m long with a mass of 5.00 g. The string is held taut with a tension of 500.00 N applied to the string. A pulse is sent down the string. How long does it take the pulse to travel the 3.00 m of the string?
yasuo Reply
Who can show me the full solution in this problem?
Reofrir Reply
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Source:  OpenStax, Chemistry of electronic materials. OpenStax CNX. Aug 09, 2011 Download for free at http://cnx.org/content/col10719/1.9
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